PVD沉积机RTSP1250

磁控溅射 薄膜 金属化薄膜

1。磁控溅射是由溅射材料等离子体涂层过程中喷射由于离子轰击到目标表面。PVD涂层机的真空室中充满了一种惰性气体,如氩气。2。磁控溅射镀膜设备-批类型包含下关键部件:磁控溅射阴极:气缸或平面类型;电源:脉冲直流、MF、射频离子源:一般为塑料/玻璃/陶瓷/金属零件辉光放电,等离子清洗。偏压电源:只适用于导电工作部分:钢、铁、钢合金、锌基压铸合金,铝合金,铜等。真空泵包:转动叶片泵、旋转活塞泵、罗茨泵、扩散泵/涡轮分子泵,泵等。其他:门威尔士人/真空仪表,MFC,真空配件及真空管道线,饲料,3。RTSP系列涂料设备用于生产导电、导电功能涂料、审美的目的。答:应用程序:ITO涂料玻璃触摸屏,显示;建筑玻璃; automotive industry: car wheels & rims, car mirrors, head lamps, tail lights, plastic interior & exteriors; tableware & kitchenware, jewelry, sport and toys, water-electroplating replacement. B. Coating materials: Metals: Ti (Titanium), Cr Chromium), Zr (Zirconium), Cu (Copper), Al (Aluminum), Ni (Nickel), SUS316 (Stainless steel) ... Metal Alloys: Ti-Al alloy, Ni-Ca alloy (Nickel - Cadmium), ITO (Indium Tin Oxide) C. Sputtering methods: DC/MF/RF D. Feature: low-temperature deposition